The German analysis institute is engaged on the event of superior, high-resolution materials and skinny movie characterization strategies that will likely be a set of simplified and speedy measurement strategies for routine use in mental property investigations.
Germany’s Fraunhofer Center for Silicon Photovoltaics (Fraunhofer CSP) has developed a variety of high-resolution materials and thin-film microscopic and nanoscopic characterization strategies to be used in patent infringement detection with larger effectivity. of photo voltaic PV merchandise.
The work belongs to a undertaking identified in Germany as IP-Schutz. The undertaking, which is able to run till March 2027, gives researchers with the mandatory framework to develop experimental strategies as a foundation for a dependable service within the area of mental property (IP) and patent infringement investigation for to undertaking companions and prospects.
The anticipated result’s a set of simplified and speedy measurement strategies for routine use in IP investigations, enabling legally safe proof.
The effort is pushed by the growing variety of patent instances initiated in lots of areas world wide, based on Stefan Lange, staff supervisor and IP-Schutz undertaking chief at Fraunhofer CSP.
“Today, a cost-efficient and extremely automated PV cell and module fabrication might be established wherever, however the growth of latest photo voltaic cell and module applied sciences is time-consuming and costly,” Lange stated. pv journal. “Typically, patents contain solely microscopic or nanoscopic options or skinny movie interfaces whose properties are tough to determine.”
PV applied sciences reminiscent of tunnel oxide passivated contact (TOPCon), silicon heterojunction (SHJ), and interdigitated again contact (IBC) units require extra subtle evaluation strategies with higher spatial decision and sensitivity to measure, based on Lange.
Some of the related non-destructive measurement applied sciences and large-area preparation strategies for use at Fraunhofer CSP are plasma sharpening and pulsed laser ablation, but additionally time-of-flight-SIMS (ToF- SIMS), transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS) to look at cell interfaces, microscopic present pathways, and passivation layers.
Lange factors out that this kind of analysis is completely different from typical analysis and growth (R&D) as a result of the strategies have to be tailored to suit the industrial module samples, fairly than the opposite approach round.
“At Fraunhofer CSP, we’ve sufficient expertise for R&D providers reminiscent of analyzing cells from industrial modules, writing technical experiences and knowledgeable opinions, all with authorized security, ” he stated, including that the documentation is extra intensive and full than the common R&D help, and there’s no margin for error.
Together with the analysis companion, Anhalt University of Applied Sciences, the Fraunhofer CSP is already gathering info and materials samples from industrial companions to grasp their patent-related wants.
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