Germany’s Fraunhofer Institute for Solar Energy Systems (Fraunhofer ISE) at present unveiled a 120 µm skinny photo voltaic cell kind based mostly on tunnel oxide passivated contact (TOPCon) expertise and M10 (182mm) wafers.

The analysis institute claims to be the primary European scientific entity to change to large-area M10 silicon wafers for TOPCon cells. “We are more than happy that we are able to now help our industrial companions in optimizing their manufacturing processes on this giant space wafer format and even within the new entry into the manufacturing of such photo voltaic cells, ” says Fraunhofer ISE researcher Sabrina Lohmüller.

Fraunhofer ISE introduced the brand new large-format TOPCon photo voltaic cell idea to unspecified trade representatives and funding our bodies through the latest twentieth Photovoltaic Technology Advisory Board Meeting.

It additionally mentioned that the cell was metalized by screen-printed contact fingers and calibrated by scientists at Germany’s Institute for Solar Energy Research Hamelin (ISFH).

“Achieving an effectivity of 24.0% within the first batch means that we are able to exceed 25% within the subsequent optimization steps,” mentioned Ralf Preu PD, director of the Photovoltaics Division at Fraunhofer ISE. “This latest achievement lays the muse for our medium-term objective of large-area silicon-based tandem photo voltaic cells with potential efficiencies in extra of 30%.”

Further particulars concerning the cell expertise and its doable functions in industrial manufacturing haven’t been disclosed.

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