Electron micrograph cross-section of a perovskite photo voltaic cell with a layer of the brand new high-performance materials. Shown is a holeless transnport layer and electrode
Image: Canon
Japan-based optical imaging and printing know-how firm Canon has introduced a brand new useful materials that can be utilized as a passivation layer with perovskite skinny movies, probably bettering sturdiness whereas simplifying the fabrication technique of perovskite photo voltaic cells. . Samples can be accessible this month with manufacturing volumes anticipated in 2025.
The firm mentioned that the analysis underlying the brand new product was validated by researchers at Japan’s Toin University, led by Tsutomu Miyasaka, and Canon, detailed in “Phthalocyanine-Based Polycrystalline Interlayer Simultaneously Realizing Collection on Charge and Ion Defect Passivation for Perovskite Solar Cells, ” revealed by Journal of Materials Chemistry A.
The paper describes the fabrication of perovskite photo voltaic cells with a passivation layer that displays Lewis base performance by way of an natural semiconductor manufactured from gallium phthalocyanine hydroxide (OHGaPc).
The firm defined that the brand new materials was developed as a element for digital workplace gear and laser printing merchandise. The coating is utilized at a thickness of 100 nm to 200 nm. Its key attribute is the flexibility to cowl the perovskite layer thickly, whereas sustaining a excessive price of photoelectric conversion effectivity.
Canon is sending samples beginning in June 2024 to corporations engaged in mass manufacturing of perovskite photo voltaic cells. Going ahead, Canon will work on additional technological growth and goals to begin mass manufacturing in 2025.
This content material is protected by copyright and might not be reused. If you wish to cooperate with us and wish to reuse a few of our content material, please contact: editors@pv-magazine.com.